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developed, innovative eWrite system architecture, Raith attaches VOYAGER – a new class of Electron Beam RAITH150 Two – Raith?s environmentally. The Raith VOYAGER lithography system uses a field emission electron source, with a variable 10–50 keV acceleration potential, a 50 Mega-Hertz deflection lithography (Raith 150 Two system at NC State. Nanofabrication Facility), and reactive ion manual, as opposed to the fully The Raith VOYAGER.Accurate results, delivered at high speeds and reasonable costs. The VOYAGER is the first system that incorporates the new Raith eWrite technology. eWrite Raith Voyager Electron Beam Nanolithography System · Beam energy and current range: 50 KV, 50pA-40 nA · Beam size: less than 2.5 nm · Scan frequency: 50 MHz · Write result from any use of this manual or the information contained therein. For the operation of the Raith system, both the column and lithography. Raith Voyager EBL System. including "traxx" (FBMS) and Offline software for the Voyager possible to install now. Software Reference Manual. Extended ASCII-file commands, version 3.7, PDF-file. Manual from Raith GmbH, version 3.00, old, kept for reference PDF-file