Gas-source MBE growth of strain-relaxed Si1-xCx on Si (100) substrates
2013.09.01 12:07
Keisuke Arimoto, Shoichiro Sakai, Hiroshi Furukawa, Junji Yamanaka, Kiyokazu Nakagawa, Noritaka Usami, Yusuke Hoshi, Kentarou Sawano, Yasuhiro Shiraki
Journal of Crystal Growth 378, 212–217 (2013). DOI: https://doi.org/10.1016/j.jcrysgro.2012.12.152(外部サイト)