Reliable reduction of Fermi-level pinning at atomically matched metal/Ge interfaces by sulfur treatm

“Reliable reduction of Fermi-level pinning at atomically matched metal/Ge interfaces by sulfur treatment”

K. Kasahara, S. Yamada, T. Sakurai, K. Sawano, H. Nohira, M. Miyao, and K. Hamaya

Applied Physics Letters 104, 172109 (2014) ; DOI: https://doi.org/10.1063/1.4875016(外部サイト)