Compressively strained Si/Si1-xCx heterostructures formed on Ar ion implanted Si(100) substrates
2016.02.01 12:35
“Compressively strained Si/Si1-xCx heterostructures formed on Ar ion implanted Si(100) substrates”
Yusuke Hoshi, You Arisawa, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, and Noritaka Usami
Japanese Journal of Applied Physics 55, 031302 (2016). DOI: https://doi.org/10.7567/JJAP.55.031302(外部サイト)